Description:
X-ray Photoelectron Spectroscopy (XPS) survey spectra from silicon wafers, allowing identification of residual surface contaminants after initial treatment (red plot), and confirming derivatisation after subsequent organosilane reaction (green & blue traces). XPS is an effective tool for obtaining a compositional analysis as well as chemical bonding information from the first few surface atomic layers (up to 5-10 nanometres depth). Varying take-off angle (TOA) allows different surface depths to be sampled within this range (Data Copyright QinetiQ).

Industry Sectors:
Data Storage, Semiconductor, MicroSystems/MEMS, Photonics/Optoelectronics

Techniques:
X-ray Photoelectron Spectroscopy

Keywords:
contaminant detection, surface treatment, cleaning