Techniques
Transmission Electron Microscopy (TEM)
 

 

HRTEM image from a segment of a filled multi-walled carbon nanotube (Copyright QinetiQ Ltd.)

Transmission Electron Microscopy (TEM) uses a high energy (100-400keV) focused electron beam to generate ultra-high resolution images of thin samples, allowing lattice imaging in the case of crystals. Bulk samples require careful preparation (in plan-view or cross-section) by polishing and/or ion beam thinning to achieve electron transparency. Individual features or devices can be targeted. Free nanoparticles and nanofibres can be analysed directly.  

The technique can be coupled with Energy-Dispersive X-ray analysis (EDX) and Electron Energy Loss Spectroscopy (EELS) providing nanoscale elemental analysis and chemical bonding information. Detailed local crystallographic analysis (phase, orientation, defects and strain) is also possible.

Key Information
  • Image area: 10 nm to 20 microns
  • Resolution: 0.2 nm (High-resolution TEM; Lattice imaging)
  • Bright-field & dark-field imaging
  • Local elemental analysis using EDX and EELS
  • Selected area diffraction
Common Applications
  • Cross-section analysis
  • Multilayer thickness determination
  • Defect characterisation
  • Interfacial layers (roughness, defects, bonding, ultra-thin layers)
  • Local crystal structure determination and visualisation
  • Semiconductor device imaging
  • Polycrystal grain structure
  • Nanoparticle and nanotube size, shape and structure determination
CEMMNT Benefits
Application Notes