Techniques
X-ray Photoelectron Spectroscopy
X-ray Photoelectron Spectroscopy gives elemental and compositional information from the top few surface atomic layers. Incident soft X-rays induce photoelectron emission from the sample, and kinetic energy analysis of the electrons emitted without experiencing energy losses enables identification of the atom and orbital of origin. Information on bonding, oxidation states and chemical environments is derived from small “chemical” shifts in the binding energies of these electrons. Sampling depth is characterised by an exponential decay length of typically a few monolayers. Surface sensitivity can be further enhanced by use of shallow take-off angles, and depth profiling can be carried out using ion sputtering.

Auger electron spectroscopy (AES) is also available if small-area (e.g. down to ca. 1 micron area) surface analysis is required.
X-ray Photoelectron Spectroscopy

X-ray Photoelectron Spectroscopy (XPS) survey spectrum from a treated silicon wafer before (red) and after (green & blue) reaction with organosilan

Key Information
  • Surface elemental composition (quantitative) and impurities
  • Oxidation state and chemical bonding information
  • Elements detected: all except hydrogen and helium
  • Sampled depth: <5-10 nm
  • Sensitivity: few % of monolayer
  • Analysis area: 1 – few mm
  • Surface microanalysis using Auger electron spectroscopy (AES)
Common Applications
  • Analysis or organic and inorganic residues and contaminants
  • Surface elemental/chemical analysis
  • Determination of thin film composition
  • Coverage and thickness of ultrathin surface layers
  • Identification / surface analysis of powders
CEMMNT Benefits
Application Notes