Industry Sectors
Microelectronics


Metrology is critical for characterising both device performance and in failure analysis. 3-D critical dimensions determination is becoming increasing critical in the drive to further minaturisation.

Commonly applied techniques include non contact optical and confocal profilometry which can non-destructively map PCB’s, determining feature volumes, track widths etc.

Infra-red and Raman chemical mapping techniques can identify chemical composition of materials causing failure such as organic residues, solder leakage and corrosion.  Thermal imaging and stress determination are also key tools for identifying causes of failure.

Microelectronics
Solder bumps, optical profilometry

Core Design, Measurement and Characterisation Capabilities

Critical dimensions
Coatings characterisation
Contaminant identification
Film thickness and stress
Depth profiling
Stress measurement
Thermal imaging

Key Techniques

Optical Profilometry
Cofocal Laser Scanning Profiometry

Stylus Profilometry
Scanning Electron Microscopy
Energy Dispersive X-ray Analysis

Atomic Force Microscopy
Stress Measurement
Secondary  Ion Mass Spectrometry
X-ray Photoelectron Spectroscopy
X-ray Diffraction
Fourier Transform Infra-red Spectroscopy
MicroRaman Spectroscopy
Ellipsometry
Thermal Imaging
                                                                                                                
Solder flux residue identification, FTIR Spectroscopy 

Application Notes